Thin films obtained by direct pulsed excimer laser irradiation and by laser reactive ablation were characterized by scanning electron microscopy, cross sectional transmission electron microscopy and grazing angle X-ray diffraction. The results obtained were interpreted in function of the deposition parameters such as substrate temperature, pressure of the ambient atmosphere, number of laser pulses and laser fluence.
Microstructural characterisation of thin films obtained by laser irradiation / Mengucci, Paolo; Barucca, Gianni; R., Marzocchini; G., Leggieri. - In: MICROSCOPY MICROANALYSIS MICROSTRUCTURES. - ISSN 1154-2799. - 6:(1995), pp. 685-692. [10.1051/mmm:1995158]
Microstructural characterisation of thin films obtained by laser irradiation
MENGUCCI, Paolo;BARUCCA, Gianni;
1995-01-01
Abstract
Thin films obtained by direct pulsed excimer laser irradiation and by laser reactive ablation were characterized by scanning electron microscopy, cross sectional transmission electron microscopy and grazing angle X-ray diffraction. The results obtained were interpreted in function of the deposition parameters such as substrate temperature, pressure of the ambient atmosphere, number of laser pulses and laser fluence.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
