Herein, we present the results obtained with a field effect transistor fabricated using a thin gallium selenide (GaSe) flake as the channel. The fabricated device exhibits n-type conduction behaviour and shows a photo response under illumination by a laser. Notably, the device exhibits memory behaviour maintaining stability for more than 4 hours with repeatable cycles and sensitivity to light stimuli. This confirms its potential as a non-volatile optoelectronic memory, offering an enhanced programming window under laser illumination. The results provide a fundamental understanding of n-type conduction of GaSe thin flake and demonstrate that the investigated material could be suitable for future opto electronic devices.

n-type GaSe thin flake for opto electronic devices / Kumar, A; Pelella, A; Intonti, K; Viscardi, L; Durante, O; Giubileo, F; Camilli, L; Neill, H; Patil, V; Ansari, L; Hurley, Pk; Gity, F; Di Bartolomeo, A. - In: IL NUOVO CIMENTO C. - ISSN 2037-4909. - 48:4(2025), pp. 181.1-181.4. [10.1393/ncc/i2025-25206-y]

n-type GaSe thin flake for opto electronic devices

Kumar, A
Primo
;
2025-01-01

Abstract

Herein, we present the results obtained with a field effect transistor fabricated using a thin gallium selenide (GaSe) flake as the channel. The fabricated device exhibits n-type conduction behaviour and shows a photo response under illumination by a laser. Notably, the device exhibits memory behaviour maintaining stability for more than 4 hours with repeatable cycles and sensitivity to light stimuli. This confirms its potential as a non-volatile optoelectronic memory, offering an enhanced programming window under laser illumination. The results provide a fundamental understanding of n-type conduction of GaSe thin flake and demonstrate that the investigated material could be suitable for future opto electronic devices.
2025
technological applications
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11566/347614
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