Carbon nitride films were deposited on 〈111〉 Si substrates by XeCl laser ablation of graphite in low-pressure (1-50 Pa) N2 atmosphere at fluences of 12 and 16 J/cm2. Substrates were usually at room temperature. Some films were deposited on heated (250 or 500°C) substrates. Different diagnostic techniques (SEM, TEM, RBS, XPS, FTIR, XRD) were used to characterize the deposited films. Films resulted plane and well adherent to their substrates. N/C atomic ratios up to 0.7 were inferred from RBS measurements. Nitrogen content increases with increasing ambient pressure and laser fluence. XPS spectra of the N 1s peak indicate two different bonding states of nitrogen atoms, bound to sp2-coordinated C atoms and to sp3-coordinated C atoms. XRD and TEM analyses point to an oriented microcrystalline structure of the films. Heating of the substrates results in a lower nitrogen concentration with respect to films deposited at room temperature in otherwise identical experimental conditions. Optical emission studies of the laser plasma plume indicate a positive correlation between the emission intensity of the CN radicals in the plume and the nitrogen atom concentration in the films.

Study of carbon nitride synthesis and deposition by reactive laser ablatio of graphite in low-pressure nitrogen atmosphere / M. L., DE GIORGI; G., Leggieri; A., Luches; A., Perrone; A., Zocco; J., Zemek; M., Trchova; Barucca, Gianni; Mengucci, Paolo. - In: LASER PHYSICS. - ISSN 1054-660X. - 8(1):(1998), pp. 270-274.

Study of carbon nitride synthesis and deposition by reactive laser ablatio of graphite in low-pressure nitrogen atmosphere

BARUCCA, Gianni;MENGUCCI, Paolo
1998-01-01

Abstract

Carbon nitride films were deposited on 〈111〉 Si substrates by XeCl laser ablation of graphite in low-pressure (1-50 Pa) N2 atmosphere at fluences of 12 and 16 J/cm2. Substrates were usually at room temperature. Some films were deposited on heated (250 or 500°C) substrates. Different diagnostic techniques (SEM, TEM, RBS, XPS, FTIR, XRD) were used to characterize the deposited films. Films resulted plane and well adherent to their substrates. N/C atomic ratios up to 0.7 were inferred from RBS measurements. Nitrogen content increases with increasing ambient pressure and laser fluence. XPS spectra of the N 1s peak indicate two different bonding states of nitrogen atoms, bound to sp2-coordinated C atoms and to sp3-coordinated C atoms. XRD and TEM analyses point to an oriented microcrystalline structure of the films. Heating of the substrates results in a lower nitrogen concentration with respect to films deposited at room temperature in otherwise identical experimental conditions. Optical emission studies of the laser plasma plume indicate a positive correlation between the emission intensity of the CN radicals in the plume and the nitrogen atom concentration in the films.
1998
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11566/53246
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